Bridging the gap between conventional wafer metrology and inspection with cutting-edge AI solutions for the angstrom era
Founded in 2021, Canopus AI is a fast-growing software and AI company dedicated to revolutionizing wafer and mask metrology and inspection. Moving towards Metrospection, by bridging the gap between conventional wafer metrology and inspection, Canopus AI provides a comprehensive software framework using AI to meet the extreme precision requirements of advanced technology nodes.
The company specializes in massive CD-SEM image Metrology, offering unprecedented data throughput and accuracy for OPC/RET applications. Its solutions contribute to optimal lithography performance towards the angstrom era. This platform allows robust EPE based measurements, early identification of critical defects and extensive characterization of process variations and stochastics.
Canopus AI extends its expertise to TEM image metrology, transitioning seamlessly from 2D to 3D. This capability is reinforced by a unique engine for synthetic 2D and 3D SEM image generation, utilizing state-of-the-art AI and Machine Learning algorithms.
As an expert in Computational Metrology, Canopus AI is empowering the semiconductor industry to take the most of SEM and TEM image and master the challenges of angstrom-class manufacturing.
Canopus AI delivers comprehensive solutions that address the most challenging requirements of modern semiconductor manufacturing, from advanced metrology to process control and synthetic data generation.
Ready to revolutionize your semiconductor metrology and inspection processes? Contact us to learn more about how Canopus AI can help you achieve unprecedented precision in the angstrom era.